US Patent Issued to HANSOL CHEMICAL on Sept. 22 for "Semiconductor layer, method for manufacturing same, and transistor comprising same" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,745,575, issued on Sept. 22, was assigned to HANSOL CHEMICAL Co. LTD (Seoul, South Korea).

"Semiconductor layer, method for manufacturing same, and transistor comprising same" was invented by Hyun-Kyung Lee (Jeollabuk-do, South Korea), Jang-Hyeon Seok (Sejong-si, South Korea), Jung-Woo Park (Seoul, South Korea), Jin-Seong Park (Gyeonggi-do, South Korea), Tae Hyun Hong (Seoul, South Korea), Jiazhen Sheng (Seoul, South Korea) and Minjung Kim (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for manufacturing a semiconductor layer is provided. The method for manufacturing a semiconductor layer may include preparing a substrate, a...