US Patent Issued to HANNANOTECH on Aug. 11 for "Matting polymer composition having excellent weather resistance and impact resistance, and matte sheet including the same" (South Korean Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,703,766, issued on Aug. 11, was assigned to HANNANOTECH Co. LTD. (Daejeon, South Korea).

"Matting polymer composition having excellent weather resistance and impact resistance, and matte sheet including the same" was invented by Doo Han Ha (Yeosu-si, South Korea), Soo Wan Kim (Daejeon, South Korea) and Sung Wook Ha (Yeosu-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are a matting polymer composition having excellent weather resistance and impact resistance, and a matte sheet including the same. The matting polymer composition according to the present disclosure includes two kinds of styrene-acrylonitrile copolymers having diff...