US Patent Issued to Hanbat National University Industry-Academic Cooperation Foundation, Tokyo Institute of Technology on March 31 for "Pattern forming apparatus" (South Korean Inventors)

ALEXANDRIA, Va., March 31 -- United States Patent no. 12,589,402, issued on March 31, was assigned to Hanbat National University Industry-Academic Cooperation Foundation (Daejeon, South Korea) and Tokyo Institute of Technology (Tokyo).

"Pattern forming apparatus" was invented by Joon-wan Kim (Kanagawa, South Korea), Dong Soo Kim (Daejeon, South Korea), Min Hun Jung (Jeollanam-do, South Korea) and Hyun Ah Lee (Sejong-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a pattern forming apparatus which may form a pattern on a substrate with high precision by using a material including an organic material, the pattern forming apparatus including: a capillary facing a grounded substrate an...