US Patent Issued to HAMAMATSU PHOTONICS on Aug. 18 for "Electron beam monitoring device and electron beam irradiation system" (Japanese Inventor)

ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,712,150, issued on Aug. 18, was assigned to HAMAMATSU PHOTONICS K.K. (Hamamatsu, Japan).

"Electron beam monitoring device and electron beam irradiation system" was invented by Shinjiro Matsui (Hamamatsu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An electron beam monitoring device monitors an electron beam in an electron beam irradiation system having an electron beam irradiation device configured to irradiate an irradiation target object with the electron beam via an emission window. The electron beam monitoring device includes a first X-ray detection unit and a second X-ray detection unit. The first X-ray detection unit has a detection surfa...