US Patent Issued to GlobalFoundries U.S. on May 6 for "Defect detection system for cavity in integrated circuit" (New York Inventors)

ALEXANDRIA, Va., June 10 -- United States Patent no. 12,292,470, issued on May 6, was assigned to GlobalFoundries U.S. Inc. (Malta, N.Y.).

"Defect detection system for cavity in integrated circuit" was invented by Zhuojie Wu (Port Chester, N.Y.) and Yunyao Jiang (Mechanicville, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A structure provides a defect sensor for a cavity in an integrated circuit (IC). The structure includes a cavity defined in a substrate. A boundary is located where the cavity meets with a cavity-free area of the substrate. A metal line is arranged in a serpentine path in both a vertical and a horizontal direction and crosses the boundary. A controller may be provided that is configu...