ALEXANDRIA, Va., July 16 -- United States Patent no. 12,672,539, issued on June 30, was assigned to GlobalFoundries Singapore Pte. Ltd. (Singapore).
"Thin film resistor, thermistor and method of producing the same" was invented by Qiying Wong (Singapore), Handoko Linewih (Singapore), Phyllis Shi Ya Lim (Singapore), Chen Wai Samuel Chow (Singapore) and Yudi Setiawan (Singapore).
According to the abstract* released by the U.S. Patent & Trademark Office: "An apparatus includes a resistor structure within a back end of line (BEOL) via level. The resistor structure includes a lower resistor film, a first insulating layer over the lower resistor film, an upper resistor film over the first insulating layer, and a second insulating layer over the...