US Patent Issued to Gigaphoton on June 30 for "Extreme ultraviolet light generation system and electronic device manufacturing method" (Japanese Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,669,752, issued on June 30, was assigned to Gigaphoton Inc. (Tochigi, Japan).

"Extreme ultraviolet light generation system and electronic device manufacturing method" was invented by Gouta Niimi (Oyama, Japan) and Kotaro Miyashita (Oyama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An extreme ultraviolet light generation system includes a chamber, a target supply unit supplying a target substance to a plasma generation region including a first point in the chamber, a window allowing pulse laser light with which the target substance is irradiated to pass therethrough, an EUV light concentrating mirror concentrating extreme ultraviolet light gene...