US Patent Issued to Gigaphoton on Dec. 30 for "Extreme ultraviolet light generation apparatus and electronic device manufacturing method" (Japanese Inventors)

ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,513,808, issued on Dec. 30, was assigned to Gigaphoton Inc. (Tochigi, Japan).

"Extreme ultraviolet light generation apparatus and electronic device manufacturing method" was invented by Masaki Nakano (Oyama, Japan) and Osamu Wakabayashi (Oyama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An extreme ultraviolet light generation apparatus includes a droplet target generation device and a solid target replenishment device. The droplet target generation device includes a tank configured to melt a solid target substance to generate a liquid target substance, and a nozzle configured to continuously generate a droplet target from the liquid target sub...