US Patent Issued to Georgia Tech Research on Sept. 8 for "Methods for etch barrier deposition and devices made according to the same" (Georgia Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,467, issued on Sept. 8, was assigned to Georgia Tech Research Corp. (Atlanta).

"Methods for etch barrier deposition and devices made according to the same" was invented by Pratik Nimbalkar (Atlanta), Mohanalingam Kathaperumal (Atlanta), Madhavan Swaminathan (Atlanta) and Rao R. Tummala (Atlanta).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed herein are methods for etch barrier deposition that can include depositing a seed layer onto a substrate, depositing a metal layer onto the seed layer in a predetermined pattern, coating the metal layer with a barrier layer, directionally etching the barrier layer from a direction orthogonal to the subs...