US Patent Issued to Georgia Tech Research on May 19 for "High-affinity Cu(I) ligands and methods of use thereof" (Georgia Inventors)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,630,573, issued on May 19, was assigned to Georgia Tech Research Corp. (Atlanta).

"High-affinity Cu(I) ligands and methods of use thereof" was invented by Christoph J. Fahrni (Atlanta) and M. Thomas Morgan (Brookhaven, Ga.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Several dimethylphosphine sulfide- and phosphine-containing compounds have been discovered that chelate copper(I) with high affinity. In certain embodiments, the compounds can be used to quantify copper(I) in complex biological systems. In another embodiment, the compounds can be used for the treatment of copper(I)-related illnesses and conditions. In still other embodiments, the compounds...