US Patent Issued to General Hydrogen, China Huadian Engineering on Sept. 2 for "System and method for testing durability of gas diffusion layer (GDL)" (Chinese Inventors)

ALEXANDRIA, Va., Sept. 3 -- United States Patent no. 12,405,207, issued on Sept. 2, was assigned to General Hydrogen Corp. Ltd. (Shenzhen, China) and China Huadian Engineering Co. Ltd. (Beijing).

"System and method for testing durability of gas diffusion layer (GDL)" was invented by Zhengnan Li (Shenzhen, China), Keguang Yao (Shenzhen, China), Xin Wang (Shenzhen, China), Jianming Bai (Shenzhen, China) and Gangping Peng (Beijing).

According to the abstract* released by the U.S. Patent & Trademark Office: "A system for testing durability of a gas diffusion layer (GDL) is provided, including a clamping component, a liquid storage tank and a peristaltic pump. The clamping component is configured to fix the GDL. The liquid storage tank is conf...