US Patent Issued to GE Precision Healthcare, Rensselaer Polytechnic Institute on Sept. 22 for "System and method for metal artifact reduction in medical images using a denoising diffusion probabilistic model" (New York Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,743,836, issued on Sept. 22, was assigned to GE Precision Healthcare LLC (Waukesha, Wis.) and Rensselaer Polytechnic Institute (Troy, N.C.).

"System and method for metal artifact reduction in medical images using a denoising diffusion probabilistic model" was invented by Grigorios Marios Karageorgos (Brooklyn, N.Y.), Bruno De Man (Clifton Park, N.Y.), Ge Wang (Loudonville, N.Y.), Wenjun Xia (Troy, N.Y.) and Chuang Niu (Troy, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Various systems and methods are provided for MAR in CT images. A corrupted CT image, of a region of interest (ROI) of a subject, including artifacts caused by a metal object in th...