US Patent Issued to GE Infrastructure Technology on May 26 for "Systems and methods for material accretion detection and removal" (American, Canadian, Swiss Inventors)

ALEXANDRIA, Va., May 26 -- United States Patent no. 12,639,803, issued on May 26, was assigned to GE Infrastructure Technology LLC (Greenville, S.C.).

"Systems and methods for material accretion detection and removal" was invented by John Karigiannis (Laval, Canada), Arpit Jain (Fremont, Calif.), Raju D. Venkataramana (Camas, Wash.), Jose Antonio Cuevas Alvarez (Turgi, Switzerland), David Michael Boehmer (Atlanta) and Sam Van Orman (Atlanta).

According to the abstract* released by the U.S. Patent & Trademark Office: "A system for monitoring at least one component is provided. The system includes at least one processor in communication with at least one memory device. The at least one processor is programmed to store a plurality of baselin...