ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,553,139, issued on Feb. 17, was assigned to GE Infrastructure Technology LLC (Greenville, S.C.).

"Fluoride ion cleaning systems" was invented by Jonathan Matthew Lomas (Simpsonville, S.C.), Shan Liu (Central, S.C.), Michael Anthony DePalma (Simpsonville, S.C.), Malorie Myers Burnette (Greenville, S.C.) and James C. Dalton (Marietta, S.C.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A fluoride ion cleaning system is provided. The system includes a retort including an interior sized to receive at least one component therein. The at least one component has a target area defined thereon. The system also includes a gas distribution system. The gas distribu...