US Patent Issued to FUJIMI on May 12 for "Method for producing wetting agent for semiconductor, containing polyvinyl alcohol composition, polishing composition containing wetting agent for semiconductor, obtained by the production method, and method for producing polishing composition" (Japanese Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,624,172, issued on May 12, was assigned to FUJIMI Inc. (Kiyosu, Japan).

"Method for producing wetting agent for semiconductor, containing polyvinyl alcohol composition, polishing composition containing wetting agent for semiconductor, obtained by the production method, and method for producing polishing composition" was invented by Hisanori Tansho (Kiyosu, Japan), Kohsuke Tsuchiya (Kiyosu, Japan), Hiroki Yamaguchi (Kiyosu, Japan), Reiko Akizuki (Kiyosu, Japan) and Ryunosuke Ando (Kiyosu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "To provide a polyvinyl alcohol composition effectively suppressed in generation of an aggregated product, in a metho...