US Patent Issued to FUJIMI on June 23 for "Method for filtering polishing additive-containing liquid, polishing additive-containing liquid, polishing composition, method for producing polishing composition, and filter" (Japanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,662,612, issued on June 23, was assigned to FUJIMI Inc. (Kiyosu, Japan).

"Method for filtering polishing additive-containing liquid, polishing additive-containing liquid, polishing composition, method for producing polishing composition, and filter" was invented by Shinji Furuta (Kiyosu, Japan), Takashi Hayakawa (Kiyosu, Japan), Keiji Ashitaka (Kiyosu, Japan), Naoya Miwa (Kiyosu, Japan), Kohsuke Tsuchiya (Kiyosu, Japan), Hisanori Tansho (Kiyosu, Japan) and Reiko Akizuki (Kiyosu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a method for filtering an additive-containing liquid that can achieve a polishing composition exhibiting excelle...