US Patent Issued to Fujikura on March 17 for "Capacitance sensor and method for producing capacitance sensor" (Japanese Inventor)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,578,494, issued on March 17, was assigned to Fujikura Ltd. (Tokyo).

"Capacitance sensor and method for producing capacitance sensor" was invented by Takashi Kameshima (Sakura, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A capacitance sensor includes a translucent base film, a translucent resist layer disposed on a part of a main surface of the translucent base film and having higher adhesion to a conductive polymer than to the translucent base film, and a translucent electrode including a conductive material containing the conductive polymer and disposed on a surface of the translucent resist layer opposite to a surface of the translucent resi...