US Patent Issued to Fujikura on Feb. 17 for "Light diffraction element unit, multistage light diffraction device, and manufacturing method for multistage light diffraction device" (Japanese Inventor)

ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,554,145, issued on Feb. 17, was assigned to Fujikura Ltd. (Tokyo).

"Light diffraction element unit, multistage light diffraction device, and manufacturing method for multistage light diffraction device" was invented by Hiroyuki Yamagishi (Chiba, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A light diffraction element unit includes an optically-transparent substrate; a light diffraction element disposed on a main surface of the optically-transparent substrate; and a three-dimensional alignment mark disposed on the main surface in a vicinity of the light diffraction element and having a thickness greater than a thickness of the light diffraction e...