ALEXANDRIA, Va., July 28 -- United States Patent no. 12,695,915, issued on July 28, was assigned to FUJIFILM Corp. (Tokyo).
"Composition and method for treating substrate" was invented by Moe Narita (Haibara-gun, Japan) and Nobuaki Sugimura (Haibara-gun, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "Objects of the present invention are to provide a composition having excellent dissolving ability for a transition metal-containing substance (particularly, a Ru-containing substance) and to provide a method for treating a substrate. The composition according to an embodiment of the present invention contains at least one iodic acid compound selected from the group consisting of periodic acid, iodic acid, ...