US Patent Issued to Fujifilm Electronic Materials U.S.A. on May 19 for "Polishing compositions and methods of use thereof" (Taiwanese, American Inventors)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,630,744, issued on May 19, was assigned to Fujifilm Electronic Materials U.S.A. Inc. (N. Kingstown, R.I.).

"Polishing compositions and methods of use thereof" was invented by Ting-Kai Huang (Tainan City, Taiwan), Yannan Liang (Gilbert, Ariz.), Bin Hu (Chandler, Ariz.), Chun-Fu Chen (Zhubei City, Taiwan), Ying-Shen Chuang (Taoyuan City, Taiwan), Tzu-Wei Chiu (Caotun Township, Taiwan), Sung Tsai Lin (Taoyuan City, Taiwan), Hanyu Fan (Chandler, Ariz.) and Hsin-Hsien Lu (Hsinchu City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "This disclosure relates to a polishing composition that includes an abrasive, at least two pH adjusters, a barrier film re...