US Patent Issued to FUJI on April 14 for "Plasma irradiation apparatus and plasma-treated liquid production method" (Japanese Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,604,389, issued on April 14, was assigned to FUJI Corp. (Chiryu, Japan).

"Plasma irradiation apparatus and plasma-treated liquid production method" was invented by Toshiyuki Ikedo (Nagoya, Japan) and Takahiro Jindo (Anjo, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma irradiation apparatus including a container configured to store a liquid to be treated; a plasma generating device configured to generate plasma to irradiate the liquid to be treated stored in the container; and a container temperature measuring instrument configured to measure a temperature of the container."

The patent was filed on Feb. 24, 2022, under Application No. 18...