ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,528, issued on Sept. 8, was assigned to FUJI ELECTRIC Co. LTD. (Kawasaki, Japan).
"Manufacturing method for semiconductor device" was invented by Tsunehiro Nakajima (Matsumoto-city, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device manufacturing method, including: a first treatment process for reducing an amount of oxygen and carbon adsorbed to a main surface of the conductive plate to 20 atomic % or less; a first checking process for checking whether the conductive plate has a temperature no higher than a reference temperature; a chip placement process for placing, responsive to the conductive plate having the temperature ...