US Patent Issued to FUJI ELECTRIC on June 23 for "Semiconductor apparatus and manufacturing method of semiconductor apparatus having a hydrogen increasing portion" (Japanese Inventor)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,666,672, issued on June 23, was assigned to FUJI ELECTRIC Co. LTD. (Kanagawa, Japan).

"Semiconductor apparatus and manufacturing method of semiconductor apparatus having a hydrogen increasing portion" was invented by Motoyoshi Kubouchi (Matsumoto-city, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a semiconductor apparatus including: a semiconductor substrate having an upper surface and a lower surface and containing a bulk donor; and a hydrogen increasing portion in which a hydrogen chemical concentration monotonically increases from the upper surface toward the lower surface. The hydrogen increasing portion is provided over 30% or m...