ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,557,570, issued on Feb. 17, was assigned to Fraunhofer-Gesellschaft zur Forderung der Forschung E.V (Munich).
"Method for producing a ferroelectric layer or an antiferroelectric layer" was invented by Konrad Seidel (Dresden, Germany), Maximilian Lederer (Dresden, Germany), Ricardo Revello (Dresden, Germany) and David Lehninger (Dresden, Germany).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method for producing a ferroelectric layer or antiferroelectric layer in which a layer of a paraelectric material already deposited on a surface of a substrate with a layer thickness of at least two crystallographic unit cells is introduced into an alternating elec...