US Patent Issued to FEMVIX on Aug. 18 for "Plasma-resistant two-layer coating film structure and manufacturing method thereof" (South Korean Inventors)

ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,709,807, issued on Aug. 18, was assigned to FEMVIX CORP. (Hwaseong-si, South Korea).

"Plasma-resistant two-layer coating film structure and manufacturing method thereof" was invented by Ok Ryul Kim (Yongin-si, South Korea) and Ok Min Kim (Yongin-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a plasma-resistant two-layer coating film structure including: a ceramic or metal substrate having pits on a surface thereof; a first coating layer which is a ceramic coating layer formed without cracks on the surface of the substrate by a spray coating method other than thermal spray, the layer being coated to fill the pits on the surfac...