US Patent Issued to FEMTOMETRIX on Feb. 17 for "Second-harmonic generation for critical dimensional metrology" (California Inventor)

ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,553,708, issued on Feb. 17, was assigned to FEMTOMETRIX INC. (Los Angeles).

"Second-harmonic generation for critical dimensional metrology" was invented by David L. Adler (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Systems and methods are disclosed for using second-harmonic generation of light to monitor the manufacturing process for changes that can affect the performance or yield of produced devices and/or determining critical dimensions of the produced device. A sample characterization system directs light onto a sample to produce second harmonic generation (SHG) signals and a detector generates detected SHG signals in response t...