US Patent Issued to FEI on Sept. 15 for "Laser thermal epitaxy in a charged particle microscope" (Dutch Inventors)

ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,738,446, issued on Sept. 15, was assigned to FEI Co. (Hillsboro, Ore.).

"Laser thermal epitaxy in a charged particle microscope" was invented by Rudolf Geurink (Sint-Michielsgestel, Netherlands), Hugo Cornelis Van Leeuwen (Eindhoven, Netherlands), Gerard Nicolass Anne Van Veen (Riethoven, Netherlands), Pleun Dona (Veldhoven, Netherlands), Stephan Kujawa (Veldhoven, Netherlands) and Maarten Bischoff (Uden, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to a charged particle microscope in which in-situ thermal laser epitaxy can be performed and the product analysed, methods of performing in-situ thermal laser ep...