US Patent Issued to FEI on Oct. 6 for "Aberration correction systems and charged particle microscope systems including the same" (Dutch Inventor)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,755,924, issued on Oct. 6, was assigned to FEI Co.

"Aberration correction systems and charged particle microscope systems including the same" was invented by Alexander Henstra (Utrecht, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "Aberration correction systems and charged particle microscope systems including the same. An apparatus can include a plurality of electrostatic multipole elements configured to at least partially correct an axial chromatic aberration of the charged particle beam. The apparatus additionally includes a deflector assembly with a corrector electrostatic prism. The corrector electrostatic prism can include a first corr...