ALEXANDRIA, Va., July 28 -- United States Patent no. 12,695,052, issued on July 28, was assigned to FEI Co. (Hillsboro, Ore.).

"Condensate precursors and contaminant purge apparatus and methods" was invented by Jing Wang (Lake Oswego, Ore.), Chad Rue (North Plains, Ore.) and Aurelien Philippe Jean Maclou Botman (Hillsboro, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods include arranging a substrate in a vacuum chamber of a charged particle beam microscope, wherein the substrate is held at a cryogenic temperature, and depositing on the substrate at the cryogenic temperature a condensate precursor that is stored in a crucible, wherein the deposited condensate precursor forms a deposition layer on ...