ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,531,204, issued on Jan. 20, was assigned to FEI Co. (Hillsboro, Ore.).
"Microscope aberration correction" was invented by Maurits Diephuis (Hillsboro, Ore.), Maurice Peemen (Hillsboro, Ore.), Hans Irma Stefaan Vanrompay (Hillsboro, Ore.) and Narges Javaheri (Hillsboro, Ore.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed herein are scientific-instrument support systems, as well as related methods, apparatus, computing devices, and computer-readable media. In some embodiments, a support apparatus for a scientific instrument includes an interface device and a processing device. The interface device receives Ronchigrams acquired with the scientifi...