US Patent Issued to FABRIC8LABS on Dec. 2 for "Multi-layer photoresist systems and methods for manufacturing electrochemical deposition printheads" (California Inventors)

ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,487,520, issued on Dec. 2, was assigned to FABRIC8LABS INC. (San Diego).

"Multi-layer photoresist systems and methods for manufacturing electrochemical deposition printheads" was invented by Edward White (San Diego), Shiv Shailendar (San Diego), Ryan Nicholl (San Diego) and David Pain (Carlsbad, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of forming a printhead of an electrochemical deposition system includes applying at least one first photosensitive resist layer onto a substrate including a connection circuit, exposing a portion of the at least one first photosensitive resist layer to a first light such that a first-layer region is d...