US Patent Issued to Essilor International on April 21 for "Method and apparatus for adjusting recess depth of a mold insert" (Massachusetts, Connecticut Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,605,869, issued on April 21, was assigned to Essilor International (Charenton-le-Pont, France).

"Method and apparatus for adjusting recess depth of a mold insert" was invented by Ahmed Drammeh (Arlington, Mass.) and Zbigniew Tokarski (Woodstock, Conn.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A mold device includes a first mold side configured to receive a substrate in a cavity and to couple with a second mold side, the first mold side including a sidewall and a gate, wherein the substrate is recessed in the first mold side at a substrate recess depth of 2 mm or greater, and wherein the substrate recess depth is a distance along the sidewall betwe...