US Patent Issued to EPIR on Feb. 3 for "System and method for optical mapping of semiconductor wafers at cryogenic temperatures under transmission geometry" (Illinois Inventors)

ALEXANDRIA, Va., Feb. 3 -- United States Patent no. 12,540,905, issued on Feb. 3, was assigned to EPIR INC. (Bolingbrook, Ill.).

"System and method for optical mapping of semiconductor wafers at cryogenic temperatures under transmission geometry" was invented by Issac L. Chang (Naperville, Ill.), Sushant Sonde (Darien, Ill.), Silviu Velicu (Willowbrook, Ill.) and Yong Chang (Naperville, Ill.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of performing scans on a semiconductor wafer is provided wherein the scanning motion is actuated through a system including a linear one-dimensional motion of the scan head; and rotational motion of a scanned wafer and an associated wafer holder. The wafer to be sca...