US Patent Issued to Entegris on Aug. 18 for "Precursors for selective deposition of silicon-containing films" (Connecticut Inventors)

ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,709,626, issued on Aug. 18, was assigned to Entegris Inc. (Billerica, Mass.).

"Precursors for selective deposition of silicon-containing films" was invented by Drew Michael Hood (Newtown, Conn.), Thomas M. Cameron (Newtown, Conn.) and Bryan C. Hendrix (Danbury, Conn.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Precursors for selective deposition of silicon-containing films are provided. A precursor comprises a compound of the formula: R(HO)Si(OR1)(OR2), where: R is or comprises an alkyl, an alkenyl, or an alkoxy; and R1 and R2 are independently a hydrogen, an alkoxyl, or R1 and R2 are bonded to form a heterocycle. Devices comprising silicon-containin...