US Patent Issued to ENPULSE, SK hynix on Sept. 15 for "Method for refreshing polishing pad and method for manufacturing semiconductor device using the same" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,734,640, issued on Sept. 15, was assigned to ENPULSE Co. LTD. (Chungcheongnam-do, South Korea) and SK hynix Inc. (Gyeonggi-do, South Korea).

"Method for refreshing polishing pad and method for manufacturing semiconductor device using the same" was invented by Sung Hoon Yun (Seoul, South Korea), Jang Won Seo (Seoul, South Korea) and Jae Gon Choi (Gyeonggi-do, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to a method for refreshing a polishing pad, and, through increasing a useful life of a polishing pad used in a polishing process, is capable of reducing the amount of discarded polishing pad, and significantly...