ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,720,918, issued on Aug. 25, was assigned to Ennostar Corp. (Hsinchu City, Taiwan).

"Semiconductor device having semiconductor structure with holes" was invented by Po-Chou Pan (Hsinchu, Taiwan), Shih-Chang Lee (Hsinchu, Taiwan), Wei-Jen Hsueh (Hsinchu, Taiwan) and Sheng-Feng Kuo (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device is provided, which includes a substrate, a first semiconductor structure, a plurality of first holes, a first dielectric structure and a second semiconductor structure. The first semiconductor structure is located on the substrate. The first holes are periodically arranged in the first semicon...