ALEXANDRIA, Va., July 14 -- United States Patent no. 12,680,185, issued on July 14, was assigned to ENEOS Corp. (Tokyo) and DE NORA PERMELEC LTD (Fujisawa, Japan).
"Organic hydride production device, water removal device, and water removal method" was invented by Kota Miyoshi (Tokyo), Hideo Otsu (Fujisawa, Japan), Hiroki Domon (Fujisawa, Japan) and Jun Sunami (Fujisawa, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An organic hydride production device includes an electrolyzer and a water removal device. The electrolyzer has a cathode chamber. The water removal device has a container that stores a catholyte fed from the cathode chamber, a drain pipe that discharges dragged water from the container, a d...