US Patent Issued to eMagin on June 16 for "System and method for direct patterning using a compensated shadow mask" (New York Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,660,491, issued on June 16, was assigned to eMagin Corp. (Hopewell Junction, N.Y.).

"System and method for direct patterning using a compensated shadow mask" was invented by Ilyas I. Khayrullin (Hopewell Junction, N.Y.), Howard Lin (Hopewell Junction, N.Y.), Fangchao Zhao (Hopewell Junction, N.Y.), Timothy Considine (Hopewell Junction, N.Y.), Laurie Sziklas (Hopewell Junction, N.Y.), Kerry Tice (Hopewell Junction, N.Y.) and Amalkumar P. Ghosh (Hopewell Junction, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Systems and methods for performing direct patterning of a material on a substrate with high fidelity to a desired pattern are presented. A pat...