ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,738,094, issued on Sept. 15, was assigned to Electronics and Telecommunications Research Institute (Daejeon, South Korea).
"Facial recognition method and apparatus based on masking" was invented by Ho-Sub Yoon (Daejeon, South Korea), Jae-Hong Kim (Daejeon, South Korea) and Jae-Yoon Jang (Daejeon, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed herein are a facial recognition method and apparatus based on masking. The facial recognition method based on masking includes performing detection and normalization of a face area including five landmarks in an input image, separating a face portion other than a portion covered by an obstacl...