ALEXANDRIA, Va., July 30 -- United States Patent no. 12,374,802, issued on July 29, was assigned to ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE (Daejeon, South Korea).

"Meta-structure" was invented by Yong Hae Kim (Daejeon, South Korea), Chi-Sun Hwang (Daejeon, South Korea), Joo Yeon Kim (Daejeon, South Korea), Jaehyun Moon (Daejeon, South Korea), Jong-Heon Yang (Daejeon, South Korea), Kyunghee Choi (Daejeon, South Korea) and Ji Hun Choi (Daejeon, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a meta-structure. The meta-structure includes a lower electrode, a lower insulating layer on the lower electrode, a lower metal oxide layer on the lower insulating layer, a metal laye...