US Patent Issued to EBARA on Oct. 27 for "Insulating structure, electrostatic lens, and charged particle beam device" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,776,468, issued on Oct. 27, was assigned to EBARA Corp. (Tokyo).

"Insulating structure, electrostatic lens, and charged particle beam device" was invented by Yasushi Toma (Tokyo), Tsutomu Karimata (Tokyo), Sadashi Aota (Tokyo) and Shinsetsu Fujisawa (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is an insulating structure used in a vacuum for a charged particle beam device, the insulating structure including: an anode; a cathode facing the anode; and an insulator disposed between the anode and the cathode, wherein the insulator has: an insulator flat surface; and an insulator convex portion protruding from the insulator flat surface, the...