ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,547,154, issued on Feb. 10, was assigned to EBARA Corp. (Tokyo).

"Substrate processing apparatus and non-transitory computer readable medium" was invented by Mitsunori Sugiyama (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A control device of a substrate processing apparatus is configured to execute: calculating patterns for changing an order of loading to the substrate processing apparatus for multiple substrates loaded to the substrate processing apparatus; generating, for each obtained pattern, a time table in which process end times in the polishing device, the cleaning device, and the transport device are associated, so that an idling state...