ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,703,063, issued on Aug. 11, was assigned to EBARA Corp. (Tokyo).
"Substrate processing apparatus" was invented by Matsutaro Miyamoto (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "The substrate processing apparatus according to the disclosure is a substrate processing apparatus for processing a substrate. The substrate processing apparatus includes a swing module, which includes a base portion, an arm which is supported by the base portion and is rotatable about the base portion, and a cover which covers an upper surface of the arm. The cover has an elongated shape in plan view and has a protrusion formed on an outer peripheral portion of an uppe...