US Patent Issued to EBARA on April 7 for "Substrate cleaning device, substrate processing device, and maintenance method for substrate cleaning device" (Japanese Inventors)

ALEXANDRIA, Va., April 7 -- United States Patent no. 12,594,583, issued on April 7, was assigned to EBARA Corp. (Tokyo).

"Substrate cleaning device, substrate processing device, and maintenance method for substrate cleaning device" was invented by Shuichi Suemasa (Tokyo), Mitsuru Miyazaki (Tokyo), Shozo Takahashi (Tokyo) and Takuya Inoue (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate cleaning device (31) includes a roll cleaning member (61) and a rotation holding portion (100). The rotation holding portion (100) includes a non-contact sealing portion (140) that is disposed between a bearing portion (130) and the roll cleaning member (61) to seal a gap between a shaft portion (110) and a ho...