ALEXANDRIA, Va., June 16 -- United States Patent no. 12,656,679, issued on June 16, was assigned to DUPONT ELECTRONIC MATERIALS INTERNATIONAL LLC (Marlborough, Mass.).

"Compounds and photoresist compositions including the same" was invented by Li Cui (Westborough, Mass.), Emad Aqad (Northborough, Mass.), Yinjie Cen (Shrewsbury, Mass.), Conner A. Hoelzel (Brookline, Mass.), James F. Cameron (Brookline, Mass.), Jong Keun Park (Shrewsbury, Mass.), Suzanne M. Coley (Mansfield, Mass.) and Choong-Bong Lee (Westborough, Mass.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A compound represented by Formula (1):wherein X is a group having a valency of r; each R1 is independently an organic group comprising an acid-la...