ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,703,826, issued on Aug. 11, was assigned to Dongwoo Fine-Chem Co. Ltd. (Iksan-si, South Korea) and Samsung Electronics Co. LTD. (Suwon-si, South Korea).
"Etchant composition, a pattern formation method and a manufacturing method of array substrate using the etchant composition" was invented by Jin-Kyu Roh (Gangbuk-gu, South Korea), Ji-Won Kim (Iksan-si, South Korea), Kyu-Sang Ahn (Yeongdeungpo-gu, South Korea), Hee-Suk Woo (Hwaseong-si, South Korea), Jung-Min Oh (Hwaseong-si, South Korea), Sang-Won Bae (Hwaseong-si, South Korea) and Hyo-San Lee (Hwaseong-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "An etchant composition contains (A) a...