US Patent Issued to DISCO on June 16 for "Facet region detection method and wafer generation method" (Japanese Inventor)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,654,254, issued on June 16, was assigned to DISCO Corp. (Tokyo).

"Facet region detection method and wafer generation method" was invented by Satoshi Genda (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A facet region detection method includes a first irradiation step and a second irradiation step in which a first surface and a second surface, respectively, of an ingot are irradiated with light, and a first fluorescence detection step and a second fluorescence detection step in which distribution of the number of photons of fluorescence in the first surface and the second surface, respectively, is obtained. The facet region detection method furthe...