ALEXANDRIA, Va., April 15 -- United States Patent no. 12,604,714, issued on April 14, was assigned to DISCO Corp. (Tokyo).
"Lift-off method" was invented by Masato Terajima (Tokyo), Junya Mimura (Tokyo), Tasuku Koyanagi (Tokyo), Hiroshi Morikazu (Tokyo) and Yuki Suto (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "A lift-off method includes joining a transfer substrate to a face side of an optical device layer of an optical device wafer with a joining member interposed therebetween, thereby making up a composite substrate, applying a pulsed laser beam having a wavelength transmittable through the epitaxy substrate and absorbable by a buffer layer, from a reverse side of the epitaxy substrate of the opt...