US Patent Issued to DIC on Aug. 11 for "Resistivity adjustment device and resistivity adjustment method" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,702,961, issued on Aug. 11, was assigned to DIC Corp. (Tokyo).

"Resistivity adjustment device and resistivity adjustment method" was invented by Daijirou Anzai (Ichihara, Japan), Naoki Hada (Ichihara, Japan) and Kazumi Oi (Ichihara, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Even when the flow rate at which liquid is supplied varies, the variation in the resistivity of resistivity-adjusted liquid is suppressed by using a simple structure. The hollow fiber membrane module is sectioned into a liquid-phase region and a gas-phase region by hollow fiber membranes. The liquid-phase region receives liquid L whose resistivity is to be adjusted. The ga...