ALEXANDRIA, Va., March 24 -- United States Patent no. 12,585,047, issued on March 24, was assigned to Dexerials Corp. (Shimotsuke, Japan).
"Anti-reflection structure, base material with anti-reflection structure, camera module and information terminal device" was invented by Hiroshi Sugata (Shimotsuke, Japan), Hiroshi Tazawa (Shimotsuke, Japan) and Shunichi Kajiya (Shimotsuke, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is an anti-reflection structure with excellent anti-reflection performance and transparency, and with reduced generation of wrinkles on the surface. The present disclosure is an anti-reflection structure 10 including at least an adhesion layer 20 and an anti-reflection layer...